Computational lithography [electronic resource] / Xu Ma and Gonzalo R. Arce.
Material type:
TextSeries: Wiley series in pure and applied opticsPublication details: Oxford : Wiley-Blackwell, 2010.Description: xv, 226 p. : illSubject(s): Genre/Form: DDC classification: - 621.381531 22
- TK7872.M3 M3 2010
| Item type | Current library | Call number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|
| Ebook | TUS: Midlands, Main Library Athlone Online | eBook (Browse shelf(Opens below)) | Available |
Includes bibliographical references and index.
Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries.